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Safe and reliable

  • Fully enclosed transparent cover working area to protect against ambient air contamination
  • Integrated DI water production (reverse osmosis membrane, mixed bed resins, active charcoal filer)
  • Fully automated cleaning and drying process with adjustable lift-out system is combined with special heating (loading and unloading is manual)

Environmentally friendly

  • Low consumption of detergents and water
  • Low tap-water consumption

Easy to use and flexible

  • Compact plug and wash system
  • Clean room installation compatible
Industrial semiconductor processing machine with control panel and integrated wafer bath system.
Semiconductor wafers held in a metal rack being processed inside a chemical bath container.
Multiple semiconductor wafers held in a rack being lowered into a chemical bath within a processing station.
Close-up of semiconductor wafers aligned in a metal rack during chemical bath processing.

Tech Specs

Productivity:

576 lenses per 8-hour shift
Dimensions (wxdxh):

1500 x 800 x 1300 mm / 59 x 32 x 51 inches
Weight: 340 kg / 750 lb

 All technical data subject to change without notice. Verify details with Satisloh. 

Documents

Hydra-sonic Ultrasonic lens cleaning (Brochure)
pdf - 454 KB
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